Closed Tube & Soft Landing Diffusion Furnace
Close-tube phosphorus diffusion、Boron diffusion, with exhaust gas, expelled from pipe collector and cooler. And various process
gases inject into tube separately and spraying. The chose-tube diffusion process is completely free from outside interference with full protection on process quality;
- Automatic temperature and process control, and all elements are imported.
- Wafer loading with characteristics: all digital control, more reliable, credibility, steady, non-crawling, along phenomenon, high anchor
precision, long longevity, big capacity and three-dimensional automatic adjustment function.
- Can be used for Annealing Process after Implant.